Plasma Etch has introduced a revolutionary new plasma system
that incorporates two
individual plasma
etching/cleaning type/mode technologies into one complete stand alone plasma
etching/cleaning system.
The PE-100 Convertible allows the user the ability to switch
back and forth between RIE anisotropic type etching mode applications and
isotropic type etching/cleaning mode applications. Traditionally, two separate
stand alone plasma systems were necessary to achieve this capability.
The PE-100 Convertible is a perfect system for R & D,
medical devices, solar cells, optics, printed circuit boards, MEMs,
nanotechnology, life sciences, wafer level packaging, and laboratories applications
as well as many other related semiconductor processes.