Gas Plasma System
The A400 gas plasma system has a 16 x 16 x 19 in. aluminum chamber, is clean room compatible, and available in both table-top and tall free-standing cabinet versions. Gas introduction via mass flow controllers and magnetic valves ensures precise gas measurement. PLC control with error monitoring, recipe storage, and operator lockout ensure process repeatability. Plasma generation is via microwave frequency (2.54 GHz), resulting in low process temperatures and maximum chamber utilization since no internal electrodes are required. Power is variable up to 1,200 W.