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Plasma System Incorporates Two Technologies into One

Wed, 09/28/2011 - 6:55am
Plasma System Incorporates Two Technologies into OnePlasma Etch has introduced a revolutionary new plasma system that incorporates two individual plasma etching/cleaning type/mode technologies into one complete stand alone plasma etching/cleaning system.

The PE-100 Convertible allows the user the ability to switch back and forth between RIE anisotropic type etching mode applications and isotropic type etching/cleaning mode applications. Traditionally, two separate stand alone plasma systems were necessary to achieve this capability.

The PE-100 Convertible is a perfect system for R & D, medical devices, solar cells, optics, printed circuit boards, MEMs, nanotechnology, life sciences, wafer level packaging, and laboratories applications as well as many other related semiconductor processes.

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